Patent · US Expired

Hydrogen separation membrane and process for producing the same

US5827569A · kind A · utility

26Cited by
16References
14Claims
0Family size

Inventors

Key dates

Filing dateJul 28, 1995
Grant dateOct 27, 1998
Priority date
Expiry dateJul 28, 2015

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B2203/041
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A hydrogen separation membrane having a good hydrogen selective permeance and a high stability, without any deterioration, even if exposed to a high temperature atmosphere or steam, which comprises a porous ceramic membrane with SiO.sub.2 deposited and filled into pores on the surface of the membrane and a SiO.sub.2 thin film formed on the surface of the membrane as a hydrogen selectively permeable film is produced by introducing a vaporized SiO.sub.2 source into pores on the surface of a porous ceramic membrane by suction established by providing a pressure difference between both sides of the membrane and thermally decomposing the SiO.sub.2 source, thereby forming, depositing and filling SiO.sub.2 into the pores and fully coating the outer surface of the membrane with a SiO.sub.2 thin film simultaneously where the SiO.sub.2 source is preferably a tetra(lower alkoxy)silane and the deposition of the SiO.sub.2 source is preferably carried out by a chemical vapor deposition process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.