Method of depositing monomolecular layers
US5827802A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 8, 1996 |
| Grant date | Oct 27, 1998 |
| Priority date | — |
| Expiry date | Jul 8, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/22
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Method of vacuum depositing a monomolecular layer on a surface, the monomolecular layer comprising at least one element selected from groups IIa, IIIa, IVa, VIIIa, Ib, IIb, IIIb, Vb of the periodic table. The method consists in heating said surface to a predetermined temperature (T) of less than 600.degree. C. and vacuum evaporating at least the above-mentioned element for the purpose of depositing it on the receptor surface, the total atomic flow of the element(s) onto the receptor surface being from 10.sup.12 to 10.sup.15 atoms/cm.sup.2 s. According to the invention, the formation of the monomolecular layer is monitored in real time, and evaporation of the element is stopped when the complete formation of the monomolecular layer is detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.