Apparatus and method for sputtering carbon
US5830331A · kind A · utility
48Cited by
7References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1994 |
| Grant date | Nov 3, 1998 |
| Priority date | — |
| Expiry date | Sep 23, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A hydrogenated carbon film for magnetic thin film recording media is manufactured by alternating current magnetron sputtering in an atmosphere containing argon and a hydrocarbon gas. Targets mounted side-by-side cyclically sputter and discharge charge buildup according to an alternating current. Shielding between the targets directs electrons toward the anode at a given time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.