Sputtering of lithium
US5830336A · kind A · utility
55Cited by
12References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 5, 1995 |
| Grant date | Nov 3, 1998 |
| Priority date | — |
| Expiry date | Dec 5, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/352
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Lithium is sputtered from a target with a metallic lithium surface using an alternating sputtering potential with a frequency between about 8 and about 120 kHz, preferably about 10-100 kHz. The process can be used to apply lithium to electrochromic materials such as coatings on window glass.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.