Chemical vapor deposition of tin oxide films
US5830530A · kind A · utility
2Cited by
6References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 30, 1997 |
| Grant date | Nov 3, 1998 |
| Priority date | — |
| Expiry date | Jun 30, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of depositing a tin oxide film onto a heated substrate is provided, by chemical vapor deposition using a tetraalkyoxy tin compound. Further provided is a method for doping the film with platinum or palladium using a .beta.-diketonate precursor thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.