Photosensitive elastomer composition and photosensitive rubber plate
US5830621A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 1997 |
| Grant date | Nov 3, 1998 |
| Priority date | — |
| Expiry date | Apr 14, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is intended to provide a photosensitive rubber plate high in strength balance and image reproducibility and a photosensitive elastomer composition used for obtaining the rubber plate. A photosensitive elastomer composition is obtained by kneading 65 parts by weight of a phosphoric acid ester group-containing random copolymer (monomers composition: 60% of butadiene, 9% of methyl methacrylate, 20% of 2-methacryloxyethyl phosphate, 10% of styrene and 1% of divinylbenzene), 35 parts by weight of a polystyrene-polybutadiene-polystyrene type block copolymer, 15 parts by weight of 1,7-heptanediol dimethacrylate, 1 part by weight of benzoin methyl ether and 0.02 part of methylhydroquinone. By interposing this photosensitive elastomer composition between two polyester films and pressurizing them with a press, a photosensitive rubber plate having a total thickness of 3 mm is obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.