Field effect transistor utilizing the gate structure two-dimensionally
US5831303A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 10, 1996 |
| Grant date | Nov 3, 1998 |
| Priority date | — |
| Expiry date | Jul 10, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/605
Abstract
The object of the invention is a field-effect transistor comprising a drain (D) and a source (S) and a gate (G) with a determined width (W) and length (L), equipped with means (G1-G2) for generating a voltage distribution on the gate in direction of its width. The gate comprises a first end in direction of its width and a second end essentially opposite to the first end, and that a first gate contact (G1) is arranged at the first end for providing a first voltage (V.sub.G1) to the first end, and a second gate contact (G2) is arranged at the second end for providing a second voltage (V.sub.G2) to the second end, for generating a voltage distribution on the gate in direction of its width with the help of a difference voltage (V.sub.G1 -V.sub.G2) between the first (G1) and the second (G2) gate contact. On the basis of the first (V.sub.G1) and second (V.sub.G2) voltage, a determined common-mode voltage is obtained on the gate, by which the voltage level of the gate is adjusted, and the difference voltage can be used for the adjustment of the voltage distribution in the width direction of the gate. In addition, a third gate contact (G3) can be arranged on the gate for generating a deter…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.