Method for processing photosensitive material and apparatus therefor
US5834156A · kind A · utility
5Cited by
11References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 1997 |
| Grant date | Nov 10, 1998 |
| Priority date | — |
| Expiry date | Jun 13, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/164
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for processing a photosensitive material characterized in that an exposed photosensitive material is subjected to dip coating with a processing solution, according to which there are no problems encountered in plate making by the conventional dip developing method and coating developing method, rapid processing can be attained, maintenance is easy, less waste processing solution is produced, and lithographic printing plates on which uniform print images can be formed from the top end portion thereof by silver complex diffusion transfer process, and an apparatus used for the processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.