Test pattern for measuring line width of electrode and method for measuring the same
US5834795A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 2, 1997 |
| Grant date | Nov 10, 1998 |
| Priority date | — |
| Expiry date | Jan 2, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A test pattern for measuring a line width of an electrode includes a substrate; an electrode having a predetermined line width and length formed on the substrate; and, a plurality of lines extended from both ends of the electrode, whereby, first, a line width of a gate electrode in a transistor is measured accurately; second, a change in electrical characteristics of a transistor with respect to the change of the line width of a gate electrode during a fabrication process can be accurately revealed; third, comparison of changes in the line widths of a gate electrode during fabrication measured through an SEM and after completion of fabrication can be done easily; and fourth, a reliability of a completed device is easily assessable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.