Apparatus and method for exposing a liquid crystal panel by beam scanning
US5835249A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 1996 |
| Grant date | Nov 10, 1998 |
| Priority date | — |
| Expiry date | Feb 7, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An energy application apparatus and a method to operate at high speed that makes high usage of light. An exposure apparatus includes a laser oscillator, an optical shutter, imaging lenses, a screen, a vertical deflecting device, a horizontal deflecting device, a vertical moving device, a liquid crystal panel, and a controller. A light beam emitted from the laser oscillator passes through the optical shutter when in its open position, and is directed by the imaging lens onto the slit or pattern on the screen. After passing through the slit, the light is gradually made to converge by the imaging lens and to enter the galvanomirror. The galvanomirror deflects the beam by a predetermined angle in the vertical direction, and the deflected beam enters the galvanomirror. The galvanomirror deflects the beam by a predetermined angle in the horizontal direction. Thereafter, the beam exposes a desired location of the liquid crystal panel located on the stage to form an image thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.