High reflectivity, broad band mirror and process for producing such a mirror
US5835273A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | May 4, 1995 |
| Grant date | Nov 10, 1998 |
| Priority date | — |
| Expiry date | May 4, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high reflectivity, broad band mirror for a high flux laser and a process for producing such a mirror. The mirror includes a substrate on which is formed a metallic layer such as aluminum. A stack of layers are formed on the metallic layer. The stack includes alternating layers of two materials with the refractive index of one material being higher than that of the other. A surface layer of a third material is placed on the stack. The surface layer has a refractive index which varies in accordance with the continuous periodic profile. The mirror is formed by depositing the metallic layer on a substrate and forming the stack by an ion beam sputtering method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.