Amorphous multi-layered structure and method of making the same
US5837331A · kind A · utility
28Cited by
11References
18Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 13, 1996 |
| Grant date | Nov 17, 1998 |
| Priority date | — |
| Expiry date | Mar 13, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/319
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An amorphous multi-layered structure (100, 200) is formed by a method including the steps of: i) positioning a deposition substrate (101) in a physical vapor deposition apparatus (300, 400, 500) ii) ionizing a precursor of a multi-phase material within the physical vapor deposition apparatus (300, 400, 500) iv) modulating the total ion impinging energy of the ions to deposit layers having predetermined properties corresponding to the total ion impinging energy values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.