Water-developable photosensitive resin composition
US5837421A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jul 31, 1997 |
| Grant date | Nov 17, 1998 |
| Priority date | — |
| Expiry date | Jul 31, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: PA1 (1) a granular copolymer produced by polymerizing a monomer mixture comprising: PA2 (i) an aliphatic conjugated diene monomer; PA2 (ii) a monomer expressed by the general formula (I): ##STR1## (in which R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); PA2 (iii) a monomer having at least two addition-polymerizable groups, and PA2 (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; PA2 (2) a photo-polymerizable unsaturated monomer; PA2 (3) an amino group-containing compound, and PA2 (4) a photo-polymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.