Exposure apparatus implementing priority speed setting arrangement
US5838443A · kind A · utility
6Cited by
1References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 28, 1996 |
| Grant date | Nov 17, 1998 |
| Priority date | — |
| Expiry date | Aug 28, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an exposure system for printing a pattern of a mask on a photosensitive substrate while moving a stage, supporting the photosensitive substrate, sequentially to exposure positions in accordance with a speed pattern having a predetermined highest speed and a predetermined maximum acceleration, and a device for changeably setting the highest speed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.