Method for making a tantala/silica interference using heat treatment
US5843518A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 1997 |
| Grant date | Dec 1, 1998 |
| Priority date | — |
| Expiry date | Jan 9, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/32
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for making a tantala/silica interference filter on a vitreous substrate, which filter retains integrity at temperatures in excess of 600.degree. C., includes the steps of depositing by low pressure chemical vapor deposition a first coating of tantala/silica on the substrate, heat treating the first coating, and depositing by low pressure chemical vapor deposition a second coating of tantala/silica, the first and second coatings in combination providing a tantala/silica interference filter with a thickness of at least 3.5 microns on the vitreous substrate. There is further presented an electric lamp having an envelope and an interference filter applied thereto, in accordance with the above method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.