Patent · US Expired

Method and apparatus for measuring moisture content in a gas

US5844125A · kind A · utility

7Cited by
13References
18Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 1, 1997
Grant dateDec 1, 1998
Priority date
Expiry dateOct 1, 2017

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2291/02845
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A device for measuring moisture concentration in a gas is provided which includes a sensing device capable of producing physical response to an energy input and having at least one surface coated with a metal hydroxide capable of adsorbing moisture. The metal hydroxide is derived from a metal coating on the sensing device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.