Single poly devices for monitoring the level and polarity of process induced charging in a MOS process
US5844300A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 1996 |
| Grant date | Dec 1, 1998 |
| Priority date | — |
| Expiry date | Sep 19, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B69/00
Abstract
A monitoring device to monitor process induced charge employing a single layer of polysilicon forming a floating gate. The device comprises two capacitors, one for charging and the other for discharging a floating gate of an n-channel transistor. Embodiments which permit the monitoring of positive charge, negative charge and both positive and negative charge are described. The device is reusable and lends itself to in-line monitoring as opposed to some prior art devices used for end-of-line monitoring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.