Patent · US Expired

Single poly devices for monitoring the level and polarity of process induced charging in a MOS process

US5844300A · kind A · utility

25Cited by
9References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 1996
Grant dateDec 1, 1998
Priority date
Expiry dateSep 19, 2016

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B69/00

Abstract

A monitoring device to monitor process induced charge employing a single layer of polysilicon forming a floating gate. The device comprises two capacitors, one for charging and the other for discharging a floating gate of an n-channel transistor. Embodiments which permit the monitoring of positive charge, negative charge and both positive and negative charge are described. The device is reusable and lends itself to in-line monitoring as opposed to some prior art devices used for end-of-line monitoring.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.