Process for stabilizing a microchannel plate
US5845189A · kind A · utility
1Cited by
1References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 20, 1973 |
| Grant date | Dec 1, 1998 |
| Priority date | — |
| Expiry date | Dec 20, 1993 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J43/246
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The secondary emission characteristics of a microchannel plate of the type fabricated of lead oxide glass and activated by a hydrogen gas bake is stabilized by treating with another gas, such as hydrogen sulfide, at an elevated temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.