Gas agitated liquid etcher
US5846374A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 3, 1996 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | Oct 3, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67075
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A liquid etch apparatus including an outer tank for holding a liquid etch solution, which has included therein an inner cylindrical member positioned in the outer tank. At one end of the inner cylindrical member, a sparger or other gas supply means may be provided. Filters are provided between the inner cylindrical member and the outer tank. Substrates are secured in the inner tank and a propeller is provided below the substrates. Gas is introduced into the inner cylindrical member during the etch process which creates a pressure gradient between the inner tank and the outer tank, forcing particulate matter carried by the gaseous particles to circulate around to the filters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.