Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
US5846685A · kind A · utility
14Cited by
13References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 1997 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | Jan 31, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may optionally contain styryl moieties. The composition is useful as a radiation sensitive layer in imaging elements for graphic arts applications and is particularly useful in preparing durable, long-wear, printing plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.