Positive-working radiation-sensitive mixture and production of relief structures

US5846689A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhold Schwalm · Monsheim, DE
• Dirk Funhoff · Heidelberg, DE
• Horst Binder · Lampertheim, DE

Key dates

• Filing date: Sep 9, 1996
• Grant date: Dec 8, 1998
• Expiry date: Sep 9, 2016

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/106
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A positive-working radiation-sensitive mixture essentially consists of PA1 (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, PA1 (b) at least one organic compound which produces an acid under the action of actinic radiation and PA1 (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.