Monolithic micromechanical apparatus with suspended microstructure
US5847280A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 1995 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | May 23, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01P2015/0814
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A monolithic capacitance-type microstructure includes a semiconductor substrate, a plurality of posts extending from the surface of the substrate, a bridge suspended from the posts, and an electrically-conductive, substantially stationary element anchored to the substrate. The bridge includes an element that is laterally movable with respect to the surface of the substrate. The substantially stationary element is positioned relative to the laterally movable element such that the laterally movable element and the substantially stationary element form a capacitor. Circuitry may be disposed on the substrate and operationally coupled to the movable element and the substantially stationary element for processing a signal based on a relative positioning of the movable element and the substantially stationary element. A method for fabricating the microstructure and the circuitry is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.