Thickness gauging of single-layer conductive materials with two-point non linear calibration algorithm

US5847562A · kind A · utility

Assignee

• The United States of America as represented by the Administrator of the National Aeronautics and Space Administration · US

Inventors

• James P. Fulton · Hampton, US
• Min Namkung · Yorktown, US
• John W. Simpson · Madison, US
• Russell A. Wincheski · Williamsburg, US
• Shridhar Champaknath Nath · Gaithersburg, US

Key dates

• Filing date: May 8, 1997
• Grant date: Dec 8, 1998
• Expiry date: May 8, 2017

Classification

• Technology area (CPC G): Physics
• CPC primary: G01B7/105
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A thickness gauging instrument uses a flux focusing eddy current probe and two-point nonlinear calibration algorithm. The instrument is small and portable due to the simple interpretation and operational characteristics of the probe. A nonlinear interpolation scheme incorporated into the instrument enables a user to make highly accurate thickness measurements over a fairly wide calibration range from a single side of nonferromagnetic conductive metals. The instrument is very easy to use and can be calibrated quickly.