Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method
US5849369A · kind A · utility
67Cited by
5References
16Claims
0Family size
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Inventor
Key dates
| Filing date | Jun 11, 1996 |
| Grant date | Dec 15, 1998 |
| Priority date | — |
| Expiry date | Jun 11, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D4/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.