Light receiving member having a surface protective layer with a specific outermost surface and process for the production thereof
US5849446A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1997 |
| Grant date | Dec 15, 1998 |
| Priority date | — |
| Expiry date | Jan 21, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/14704
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light receiving member comprising a electrically conductive substrate, a photoconductive layer composed of a non-single crystalline material containing at least silicon atoms as a matrix formed on said substrate by decomposing a silicon-containing raw material gas, and a surface protective layer composed of a non-single crystalline carbon material containing hydrogen formed on said photoconductive layer by decomposing a raw material gas comprising at least a hydrocarbon using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz, wherein a 20 .ANG. or more thick surface side layer region of said surface protective layer composed of said non-single crystalline carbon material is etched at an etching speed of 0.1 to 50 .ANG./sec. by means of a fluorine-containing plasma produced by decomposing a fluorine-containing gas using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz such that said surface protective layer has a thickness of 100 to 10000 .ANG. and has an etched surface deposited with fluorine atoms so as to cover said etched surface. And a process for producing said light receiving member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.