Patent · US Expired

Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations

US5851293A · kind A · utility

299Cited by
21References
60Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 6, 1996
Grant dateDec 22, 1998
Priority date
Expiry dateSep 6, 2016

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01J3/002
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a motive fluid driver constructed and arranged to receive the effluent gas stream from the process, and means for sensing a flow characteristic of the effluent gas stream and responsively adjusting the flow of the effluent gas stream to damp pressure fluctuations in the process. The flow stabilization system may further comprise: (i) a variable frequency drive for motively operating the motive fluid driver at a correspondingly variable rotational speed; (ii) a pressure transducer monitor for monitoring the flow characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller coupled in pressure transduced signal-receiving relationship with the pressure transducer monitor, and responsive to the pressure transduced signal to correspondingly adjust the variable frequency drive and responsively selectively drive the motive fluid driver to damp pressure fluctuat…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.