Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials
US5852128A · kind A · utility
20Cited by
7References
8Claims
0Family size
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Key dates
| Filing date | Sep 3, 1997 |
| Grant date | Dec 22, 1998 |
| Priority date | — |
| Expiry date | Sep 3, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F212/22
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Acid-labile group protected hydroxystyrene polymers having recurrent pendant groups such as 1-(2-methanecarbonyl oxyethoxy)ethoxy group and 1-(2-N-methylcarbamatoethoxy) ethoxy group. A resist containing the polymer, a photo acid generator, a base, additives and a solvent is sensitive to UV, electron beam and X-ray. In the resist, acid is formed in the exposed area during irradiation, which deprotects acid-labile group catalytically during application of post-exposure baking. Positive patterns are formed after development using an alkaline solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.