Thin film optical waveguide and optical deflecting device
US5852702A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 1997 |
| Grant date | Dec 22, 1998 |
| Priority date | — |
| Expiry date | Feb 25, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/465
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A thin film waveguide and an optical deflecting device which have a substrate and a waveguide layer. An optical buffer layer which has a refractive index smaller than that of the waveguide layer is provided between the substrate and the waveguide layer, and the optical buffer layer has such a thickness as to make a zero mode guided light beam progressing in the waveguide layer have a propagation loss not more than 2 dB/cm and as to make a first mode guided light beam progressing in the waveguide layer have a propagation loss not less than 4 dB/cm. For example, the waveguide layer is a ZnO thin film, the substrate is a silicon substrate, and the optical buffer layer is a SiO.sub.2 thin film. Further, an interdigital transducer is provided on the waveguide layer to excite Sezawa waves as surface acoustic waves. For example, the waveguide layer is designed to have a thickness which meets the following condition: 1.0<hK<5.0 (K=2 .pi./.LAMBDA.), wherein, h is the thickness of the waveguide layer, and .LAMBDA. is the wavelengths of the Sezawa waves. Furthermore, a conductor film is provided opposite the interdigital transducer with the waveguide layer in-between.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.