Surface treating method of single crystal
US5855668A · kind A · utility
2Cited by
4References
66Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 1995 |
| Grant date | Jan 5, 1999 |
| Priority date | — |
| Expiry date | Mar 13, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N60/0604
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A surface treating method of single crystals by which single crystals for substrates having finished surfaces showing pit-free and atomic scale step structures are obtained by treating the {100}-plane surfaces of single-crystal SrTiO.sub.3 substrates by dissolving two-dimensional-lattice atomic layers forming the surfaces one layer by one layer by using a fluorine-based acidic solution (maintained at >35.degree. C. in temperature and <4 in pH) as a solution A and water as a solution B by alternately immersing the substrates in the substrates in the solution A and B.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.