Method for selective deposition modeling
US5855836A · kind A · utility
93Cited by
46References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 1997 |
| Grant date | Jan 5, 1999 |
| Priority date | — |
| Expiry date | Jun 12, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y70/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A novel thermopolymer material adapted for use in thermal stereolithography. More particularly, a thermopolymer material comprising a mixture of: a low shrinkage polymer resin; a low viscosity material such as paraffin wax; at least one microcrystalline wax; a toughening polymer, a plasticizer. Alternative embodiments further include components to improve the materials ability to transfer heat and to improve strength. The subject material, together with the described process greatly reduce part building distortions while retaining desirable toughness, strength and jetting properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.