Computer-aided engineering system for design of sequence arrays and lithographic masks
US5856101A · kind A · utility
126Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 1996 |
| Grant date | Jan 5, 1999 |
| Priority date | — |
| Expiry date | Sep 27, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC40B60/14
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.