Methods and apparatus for measuring and dispensing processing solutions to a CMP machine
US5857893A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 2, 1996 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Oct 2, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/8472
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for measuring and controlling the flow rates of processing solutions to a CMP machine during the polishing and planarization process. The apparatus comprises a processing solution source, a processing solution dispensing system for applying the solution to the CMP machine, a mechanism for transferring the processing solution from the solution source to the dispensing system, and a metering or sensing system for accurately measuring the amount of processing solution actually dispensed to the CMP machine. Preferably, the metering system comprises a coriolis mass flow meter and a controller for controlling its operation. The metering system may interface with the CMP machine controller in a feed-back loop configuration so that the actual flow rates of the solutions may be controlled in real time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.