Film forming method and apparatus therefor
US5858450A · kind A · utility
14Cited by
9References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 1997 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Jan 10, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/151
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In formation of thin films on both surfaces of a substrate such as a lens or the like, a pair of cluster beam evaporation sources are provided in mutually separate manner in a film forming chamber. The substrate is disposed between the pair of cluster beam evaporation sources. The cluster beam evaporation source includes a crucible which is arranged to be inclined toward the substrate, or which has a nozzle on a lateral face opposed to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.