Process to form mesostructured films
US5858457A · kind A · utility
158Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 25, 1997 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Sep 25, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2111/0081
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.