Acid labile photoactive composition
US5858605A · kind A · utility
2Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 1997 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Mar 8, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.