Intelligent supervision system with expert system for ion implantation process
US5859437A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1997 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Mar 17, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An intelligent supervision system on the ion beam map during ion implantation process includes an ion implanter for introducing ions into a wafer, a feature extractor for receiving a beam current signal and a display blanking signal from the ion implanter to extract features of the beam current signal; a fuzzification subsystem for justifying confidence level on the features; and an expert system for recognizing symptoms of abnormal scanning and providing an indication thereof to a human operator. The expert system also provides an indication of appropriate corrective action, which an operator then uses to adjust the implantation process. Alternatively, the expert system may be configured to provide control signals directly to the ion implanter to adjust the implantation process without the need for an operator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.