Composite structure and method for the production thereof
US5861058A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 22, 1996 |
| Grant date | Jan 19, 1999 |
| Priority date | — |
| Expiry date | Apr 22, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S117/913
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A composite structure for electronic components, having a base substrate with a flat side provided with a depression, and having a cover layer which is disposed on the flat side structured by the depression, and the depression being covered to form a hollow structure. The depression in the base substrate is created prior to the deposition of the cover layer and has a clear width measured parallel to the flat side that is less than one-half of its clear depth measured before the cover layer is applied. The vapor phase deposited cover layer is formed from a material which has a sufficiently high surface tension to promote three-dimensional growth of the vapor phase deposited layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.