Method of fabricating a resonant micromesh filter
US5861226A · kind A · utility
Inventors
Key dates
| Filing date | Dec 20, 1996 |
| Grant date | Jan 19, 1999 |
| Priority date | — |
| Expiry date | Dec 20, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of fabricating a resonant micromesh filter having conductive antenna elements sized on the order of microns. The steps comprise of first creating an exposure mask having absorbing portions capable of stopping incident ions completely and transmitting portions incapable of stopping incident ions and through which incident ions can pass. The absorbing and transmitting portions form in the mask in the pattern of the antenna elements to be fabricated. Second, an exposure mask confronting an unpatterned filter is positioned. The unpatterned filter includes: a substrate, a thin metal foil mounted on the substrate, and a resist material covering the metal flow. Third, ions are passed through the exposure mask. The absorbing portions of the mask stop the ions and the transmitting portions allow the ions to pass through the mask and expose the section of the resist material of the filter in the pattern of the antenna elements. Fourth, the exposure mask is repositioned over an area of the unpatterned filter not previously exposed to incident ions. The third step is repeated. Then fourth step is repeated until a desired surface area of the unpatterned filter has been exposed. Last, t…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.