Water-developing photosensitive resin composition
US5861232A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | May 31, 1996 |
| Grant date | Jan 19, 1999 |
| Priority date | — |
| Expiry date | May 31, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a photosensitive resin composition which is superior in water-developing properties, resilience, strength of resin plate after exposure, elongation at break, and transparency of resin plate. The composition comprises: PA1 (1) a particulate copolymer obtained by polymerizing a monomer mixture comprising: PA2 (a) an aliphatic conjugated diene monomer, PA2 (b) a monomer represented by the following general formula (I): ##STR1## and (c) a monomer having at least two groups capable of addition-polymerizing; PA1 (2) a photopolymerizable unsaturated monomer; PA1 (3) an amino group-containing compound; and PA1 (4) a photopolymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.