Photosensitive composition and photosensitive rubber plate
US5863704A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 1996 |
| Grant date | Jan 26, 1999 |
| Priority date | — |
| Expiry date | Apr 24, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition which comprises PA1 5 to 55 parts by weight of a linear block copolymer 1 consisting essentially of only one polymer block A which is a polymer consisting essentially of aromatic vinyl monomer units as the main constitutive units and conjugated diene monomer units as secondary monomer units, and only one or two polymer blocks B each of which is a polymer consisting essentially of conjugated diene monomer units as the main constitutive units and aromatic vinyl monomer units as secondary monomer units, wherein among all the monomer units the aromatic vinyl monomer units constitute 15 to 30% by weight, the conjugated diene monomer units constitute 85 to 70% by weight, the total amount of the aromatic vinyl monomer units and the conjugated diene monomer units being 100% by weight, and wherein the total amount of the aromatic vinyl monomer units constituting molecular chain portions each having 8 or more successive aromatic vinyl monomer units is 30% by weight or more of the amount of all the aromatic vinyl monomer units, PA1 10 to 60 parts by weight of a block copolymer 2 consisting essentially of at least two polymer blocks C each of which is a polymer con…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.