Surface activating process, and device and lamp for performing said process
US5864388A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 1996 |
| Grant date | Jan 26, 1999 |
| Priority date | — |
| Expiry date | Jul 11, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A surface activating process in which treatment can be performed within a short time and in which activation of undesired areas does not occur is achieved by concentrating ultraviolet light with wavelengths from 200 nm to 300 nm by means of an oval focussing mirror. The ultraviolet light is incident in parallel on a mask via a first reflector, an integrator lens, a shutter, a second reflector, and a collimator, and is radiated through the mask onto a workpiece to activation a surface area of the workpiece. The arc length of the lamp is selected to be within a range from 7.5 to 29 mm to obtain a radiation intensity which is sufficient for surface activation. Furthermore, the relationship .alpha.>1.5.degree. and the relationship d.times.tan .alpha..ltoreq.0.1 W are satisfied at the same time, where .alpha. is the visual angle of the ultraviolet light, d is the thickness of an oxygencontaining gas layer which is formed between the mask and the workpiece, and W is the width of a minimum unit of the surface areas of the workpiece to be activated. In this way entry of adverse light can be prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.