Selective chemical vapor deposition of polymers
US5869135A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 3, 1997 |
| Grant date | Feb 9, 1999 |
| Priority date | — |
| Expiry date | Oct 3, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/114
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system for selective chemical vapor deposition of polymers onto a substrate. A substrate is provided which comprises a plurality of surface regions, wherein the surface of at least one region provides a more favorable nucleation site for at least one of a polymer or polymer precursor than at least one other region. This may be an intrinsic characteristic of the substrate or may be accomplished through surface treatment of a substrate. The substrate is subjected to chemical vapor deposition of a reactive monomer, producing a polymer coating which is substantially thicker in the regions of favorable nucleation than in the regions of unfavorable nucleation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.