System for stabilization of pressure perturbations from oxidation systems for treatment of process gases from semiconductor manufacturing operations
US5873388A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 7, 1996 |
| Grant date | Feb 23, 1999 |
| Priority date | — |
| Expiry date | Jun 7, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86461
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A pressure damping system for damping pressure perturbations incident to switching of switchable flow control means in a fluid flow circuit. The pressure surge damping system comprises a throttle valve in the circuit, with the throttle valve and switchable flow control means being constructed and arranged for selective adjustment of the throttle valve when the switchable flow control means is switched, to attenuate pressure perturbations incident to switching of the switchable flow control means. The pressure surge damping system of the invention may be employed in a multi-vessel oxidation system for the treatment of semiconductor effluent gas, or in other applications involving periodic or cyclic switched flows which generate an upstream-propagating pressure wave detrimental to an upstream process facility.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.