Patent · US Expired

Method of making charge-coupled device with microlens

US5877040A · kind A · utility

94Cited by
10References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 7, 1997
Grant dateMar 2, 1999
Priority date
Expiry dateMay 7, 2017

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50

Abstract

A CCD and manufacturing method thereof is disclosed including: a first conductivity-type substrate having a convex portion; a first conductivity-type charge transmission domain formed on the substrate excluding the convex portion; a light detecting domain formed on the convex portion of the substrate and having a convex top surface; a second conductivity-type high-concentration impurity area formed on the top surface of the light detecting domain; a gate insulating layer formed on the substrate excluding the light detecting domain; a transmission gate formed on the gate insulating layer; a planarization layer formed on the substrate including the transmission gate; and a microlens formed on the planarization layer above a photodiode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.