X-ray mask
US5878105A · kind A · utility
2Cited by
1References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 1997 |
| Grant date | Mar 2, 1999 |
| Priority date | — |
| Expiry date | Aug 21, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K5/08
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray mask, which is used in transferring an image formed on a patterned mask to a wafer by exposing the mask with an X-ray, comprises a supplementary substrate attached to the back side of a support ring for preventing a thermal distortion of the X-ray mask due to the difference of thermal coefficient of expansion between a mask substrate and the support ring and for improving the resistance to the external mechanical stress, the supplementary substrate being made of the same material as the mask substrate and obtained through the same processing steps as the mask substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.