Photoresist layer supporting polyester film and photoresist film laminate
US5879854A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 6, 1997 |
| Grant date | Mar 9, 1999 |
| Priority date | — |
| Expiry date | Aug 6, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31786
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A photoresist layer supporting polyester film which is a biaxially oriented film formed from a polyester containing 0.01 to 0.1% by weight of porous silica particles that are agglomerates of primary particles having an average particle diameter of 0.01 to 0.1 .mu.m and have an average particle diameter of 0.1 to 5 .mu.m and a pore volume of 0.5 to 2.0 ml/g, the number of the porous silica coarse particles having a major diameter of not smaller than 50 .mu.m being 10 or less per m.sup.2 ; and a photoresist film laminate comprising the above polyester film and a photoresist layer and a protective film, the photoresist layer and the protective film being laminated on one surface of the photoresist layer supporting polyester film. The above photoresist layer supporting polyester film is excellent in transparency and handling properties (slipperiness), and the above photoresist film laminate has excellent resolution and is almost free from circuit defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.