Patent · US Expired

Method of producing a layer structure and the use of the method

US5882400A · kind A · utility

2Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 10, 1996
Grant dateMar 16, 1999
Priority date
Expiry dateMay 10, 2016

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2006/1204
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention concerns a method of producing a surface layer structure by doping a matrix with metal ions. The aim of the invention is to provide a method of this kind in which the depth distribution of the metal ions in the substrate can be regulated, thus optimumizing the doping without incurring any of the disadvantages inherent in the prior art methods. This is achieved by first depositing matrix material on a suitable substrate by laser ablation in an atmosphere of oxygen, thus forming a on surface of the substrate a first layer a matrix material. Dopant is then deposited on the surface of the first layer, followed by more matrix material. The result is a uniform doping of the deposited matrix at a defined depth in the surface layer structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.