Method of producing a layer structure and the use of the method
US5882400A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 10, 1996 |
| Grant date | Mar 16, 1999 |
| Priority date | — |
| Expiry date | May 10, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/1204
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention concerns a method of producing a surface layer structure by doping a matrix with metal ions. The aim of the invention is to provide a method of this kind in which the depth distribution of the metal ions in the substrate can be regulated, thus optimumizing the doping without incurring any of the disadvantages inherent in the prior art methods. This is achieved by first depositing matrix material on a suitable substrate by laser ablation in an atmosphere of oxygen, thus forming a on surface of the substrate a first layer a matrix material. Dopant is then deposited on the surface of the first layer, followed by more matrix material. The result is a uniform doping of the deposited matrix at a defined depth in the surface layer structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.