Method and device for the formation of holes in a layer of photosensitive material, in particular for the manufacture of electron sources
US5882845A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 1996 |
| Grant date | Mar 16, 1999 |
| Priority date | — |
| Expiry date | Aug 14, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/025
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and a device for the formation of holes in a layer of photosensitive material, in particular for the manufacture of electron sources. This method is characterized in that a membrane (121) with micro-perforations (122) is laid onto the layer of photosensitive material (120); the layer of photosensitive material is insolated through the membrane (121) in order to print areas (125) corresponding to the micro-perforations (122); the membrane (121) is separated from the layer of photosensitive material (120) thus insolated and the photosensitive layer (120) is then developed in order to form holes in it corresponding to the insolated areas (125).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.