Method of measuring atomic beam flux rate in film growth apparatus
US5886778A · kind A · utility
2Cited by
1References
3Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 28, 1997 |
| Grant date | Mar 23, 1999 |
| Priority date | — |
| Expiry date | Oct 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/3103
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of measuring a beam flux rate in a film growth apparatus which includes supplying a hollow cathode lamp with a current that alternates between two current values and does not include a zero current, introducing intensity-modulated spectral light emitted by the hollow cathode lamp into a vacuum chamber of a film growth apparatus, absorbing the light by a beam of atoms projected at a substrate surface, and detecting components synchronized with the modulation of the spectral light obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.