Hydrogenated amorphous silicon alloys
US5888452A · kind A · utility
1Cited by
4References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 12, 1991 |
| Grant date | Mar 30, 1999 |
| Priority date | — |
| Expiry date | Jul 12, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
Abstract
Novel hydrogenated amorphous silicon alloys are disclosed. Hydrogenated amorphous silicon alloys produced by PECVD are disclosed. A method is also disclosed for the preparation of novel hydrogenated amorphous silicon alloys for use as thin films. The method comprises subjecting a mixed gas of gas-phase silicon compounds and other gas-phase alloy element compounds to plasma enhanced chemical vapor deposition in a reaction zone such that the alloy formed is deposited on a substrate.
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